Durchflusssensor
Lade...
DOI der Originalpublikation
Projekttyp
angewandte Forschung
Projektbeginn
02.01.2006
Projektende
14.12.2006
Projektstatus
abgeschlossen
Projektkontakt
Projektmanager:in
Beteiligte
Neuhaus, Markus
Beschreibung
Zusammenfassung
Flow measurements in processes like etching, cleaning, chemical mechanical polishing and coating in semiconductor manufacturing and chemical industries require high performance flowmeters. In pro-cesses like chemical mechanical polishing (CMP) it is important that as little as possible external par-ticles generated by the flowsensor reach the abrasive liquid (slurry). These particles could damage the silicon wafer, so it is advantageous to use flowmeters that do not have any moving parts. Together with Levitronix GmbH in Zurich we developed a new flowmeter for high-purity and aggressi-ve liquids. The principle of the flow sensor is based on a balance between hydrodynamic and magne-tic forces. A floating body, containing a permanent magnet is kept at a constant position in a tube by an external solenoid. The current in the solenoid required to compensate the hydrodynamic force by a magnetttttttic force, is used as a measure for the flow rate in the tube. An integrated viscosity ...
Link
Während FHNW Zugehörigkeit erstellt
Hochschule
Hochschule für Technik
Institut
Institut für Thermo- und Fluid-Engineering
Finanziert durch
Kommission für Technologie und Innovation (KTI)
Projektpartner
Levitronix GmbH
Finanziert durch
SAP Referenz
t346-0005
Schlagwörter
Fachgebiet (DDC)
005 - Computer Programmierung, Programme und Daten