Durchflusssensor
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DOI of the original publication
Project type
angewandte Forschung
Project start
02.01.2006
Project end
14.12.2006
Project status
abgeschlossen
Project contact
Project manager
Contributors
Neuhaus, Markus
Description
Abstract
Flow measurements in processes like etching, cleaning, chemical mechanical polishing and coating in semiconductor manufacturing and chemical industries require high performance flowmeters. In pro-cesses like chemical mechanical polishing (CMP) it is important that as little as possible external par-ticles generated by the flowsensor reach the abrasive liquid (slurry). These particles could damage the silicon wafer, so it is advantageous to use flowmeters that do not have any moving parts. Together with Levitronix GmbH in Zurich we developed a new flowmeter for high-purity and aggressi-ve liquids. The principle of the flow sensor is based on a balance between hydrodynamic and magne-tic forces. A floating body, containing a permanent magnet is kept at a constant position in a tube by an external solenoid. The current in the solenoid required to compensate the hydrodynamic force by a magnetttttttic force, is used as a measure for the flow rate in the tube. An integrated viscosity ...
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Created during FHNW affiliation
Strategic action fields FHNW
School
Hochschule für Technik und Umwelt FHNW
Institute
Institut für Thermo- und Fluid-Engineering
Financed by
Kommission für Technologie und Innovation (KTI)
Project partner
Levitronix GmbH
Contracting authority
SAP reference
t346-0005